Reactors with isolated gas connectors and methods for depositing materials onto micro-device workpieces
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United States of America Patent
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Sep 15, 2009
Grant Date -
Jan 27, 2005
app pub date -
Aug 19, 2004
filing date -
Aug 15, 2002
priority date (Note) -
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Abstract
Reactors having isolated gas connectors, systems that include such reactors, and methods for depositing materials onto micro-devices workpieces are disclosed herein. In one embodiment, a reactor for depositing material onto a micro-device workpiece includes a reaction chamber, a lid attachable to the reaction chamber, and a connector. The connector has a first portion coupled to the lid, a second portion coupled to the reaction chamber, a gas passageway extending through the first and second portions, and a seal. The seal can surround the gas passageway between the first and second portions. The first portion is detachably coupled to the second portion. In one aspect of this embodiment, the connector can also include a second gas passageway extending through the first and second portions and a second seal surrounding the second gas passageway between the first and second portions.
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