Method for the generation of variable pitch nested lines and/or contact holes using fixed size pixels for direct-write lithographic systems
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United States of America Patent
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Sep 15, 2009
Grant Date -
Oct 19, 2006
app pub date -
Jun 15, 2006
filing date -
May 16, 2003
priority date (Note) -
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Abstract
Provided is a method and system for developing a lithographic mask layout. The lithographic mask layout is adapted for configuring an array of micro-mirrors in a maskless lithography system. The method includes generating an ideal mask layout representative of image characteristics associated with a desired image. Next, an equivalent mask is produced in accordance with an average intensity of the ideal mask layout.
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