Method for cleavage of labile functional groups from chemical compounds
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United States of America Patent
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Oct 6, 2009
Grant Date -
Nov 17, 2005
app pub date -
Sep 2, 2004
filing date -
Mar 4, 2002
priority date (Note) -
Expired
status (Latency Note)
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Abstract
The present invention provides a method for cleavage of labile functional groups from molecules by the action of electromagnetic radiation, wherein the molecules are contacted with a chemical compound whose triplet state is energetically higher than the triplet state of the labile functional group, and are subsequently exposed to electromagnetic radiation. Further, the invention provides a method for preparing DNA chips by spatially addressed, light-controlled nucleotide synthesis on solid substrates, said method comprising the following steps: a) reacting the unprotected terminal 3′ or 5′ hydroxy group of a nucleoside and/or of a nucleotide arranged on the solid substrate under usual conditions with a photolabile protective group and optionally purifying the reaction product, b) applying a solution, suspension or dispersion of a chemical compound, whose triplet state is energetically higher than the triplet state of the photolabile protective group, to the surface of the carrier, said surface comprising the nucleotides and/or nucleosides modified in step a): c) irradiating, in a spatially selective manner, the surface of the carrier treated in step b) with electromagnetic radiation in the UV/VIS range with simultaneous, spatially selective release of a reactive OH group and subsequently reacting it with a nucleoside and/or nucleotide comprising a 5′ or 3′OH group, said nucleoside and/or nucleotide being further provided with a photolabile functional group. Moreover, the present invention provides a chemical composition comprising a molecule having a labile functional group, as well as a chemical compound whose triplet state is higher than the triplet state of the labile functional group, and it describes the use of the chemical composition for preparing DNA chips.

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- 15 United States
- 10 France
- 8 Japan
- 7 China
- 5 Korea
- 2 Other
Patent Owner(s)
- UNIVERSITAT KONSTANZ
International Classification(s)
Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
---|---|---|---|
Steiner, Ulrich | Constance , DE | 9 | 71 |
Walbert, Stefan | Constance , DE | 1 | 0 |
Woll, Dominik | Constance , DE | 1 | 0 |
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Maintenance Fees
Fee | Large entity fee | small entity fee | micro entity fee | due date |
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Fee | Large entity fee | small entity fee | micro entity fee |
---|---|---|---|
Surcharge after expiration - Late payment is unavoidable | $700.00 | $350.00 | $175.00 |
Surcharge after expiration - Late payment is unintentional | $1,640.00 | $820.00 | $410.00 |
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