Determining positional error of an optical component using structured light patterns
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Oct 6, 2009
Grant Date -
Jul 31, 2008
app pub date -
Apr 4, 2006
filing date -
Apr 6, 2005
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
Described is an interferometric surface contour measurement system for projecting structured light patterns onto an object. The measurement system includes an interferometric projector, an imager, and a processor. The imager is rigidly coupled to the projector to maintain a stable relationship to the projected, structured light pattern. The imager receives the structured light pattern and together with the processor, determines whether the projected image includes a positional error. In some embodiments, the projector is a multi-channel projector, each channel having an optical axis spatially separated from the others, one of the channels including the imager and dedicated for determining positional error. In other embodiments, the projector is a single-channel projector projecting a structured light pattern onto the object, a portion of the structured light pattern being tapped-off for determining positional error.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully