Plasma processing system and baffle assembly for use in plasma processing system

United States of America Patent

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Oct 13, 2009
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Jul 13, 2006
app pub date
Jan 11, 2005
filing date
Jan 11, 2005

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Abstract

The present invention presents a baffle assembly located in a plasma processing system, comprising a baffle carrier attached to the plasma processing system, and at least two baffle inserts having a plurality of passages therethrough, the at least two baffle inserts being supported by the baffle carrier.

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TOKYO ELECTRON LIMITED

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Inventor Name	Address	# of filed Patents	Total Citations
Fink, Steven T	Mesa , US	68	1174

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Plasma processing system and baffle assembly for use in plasma processing system

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United States of America Patent

11032101

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PATENT NO	7601242
APP PUB NO	20060151114A1
SERIAL NO	11032101
DOCKET NO

US Family Size	Non-US Coverage
Patent Longevity	Forward Citations

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
October 13, 2009	US,7601242,B2 US7601242B2	GRANTED PATENT AS SECOND PUBLICATION
July 13, 2006	US,20060151114,A1 US20060151114A1	FIRST PUBLISHED PATENT APPLICATION

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11032101

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