Method to make wavelet watermarks resistant to affine transformations
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United States of America Patent
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Oct 13, 2009
Grant Date -
Jun 9, 2005
app pub date -
Jul 7, 2004
filing date -
Mar 8, 2001
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Abstract
A method and/or apparatus for embedding and detecting watermarks in a set of data frames, where a secondary domain is used for combining the data frame, watermark, and a geometric pattern for holding the watermark, and that secondary domain is used for post-combination filtering of the modified data frame. The secondary domain is preferably a wavelet domain or sub-band domain. The geometric pattern for holding the watermark is reversibly mapable between a complex pattern in the original domain of the data frame and a simple pattern in the secondary domain where combination and filtering takes place.
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