Manufacturing method for phase change RAM with electrode layer process

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United States of America Patent

PATENT NO 7605079
APP PUB NO 20070155172A1
SERIAL NO

11382799

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Abstract

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A method for manufacturing a phase change memory device comprises forming an electrode layer. Electrodes are made in the electrode layer using conductor fill techniques that are also used inter-layer conductors for metallization layers, in order to improve process scaling with shrinking critical dimensions for metallization layers. The electrode layer is made by forming a multi-layer dielectric layer on a substrate, etching the multi-layer dielectric layer to form vias for electrode members contacting circuitry below, forming insulating spacers on the vias, etching through a top layer in the multi-layer dielectric layer to form trenches between the insulating spacers for electrode members contacting circuitry above, filling the vias and trenches with a conductive material using the metallization process. Thin film bridges of memory material are formed over the electrode layer.

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Patent Owner(s)

Patent OwnerAddress
MACRONIX INTERNATIONAL CO LTDHSINCHU

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chen, Yi Chou Cupertino , US 24 504
Ho, Chiahua Kaohsiung , TW 74 3941
Hsieh, Kuang Yeu Jhubei , TW 65 3244
Lai, Erh Kun Longjing Shaing , TW 30 766

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