Programmable photolithographic mask based on semiconductor nano-particle optical modulators
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United States of America Patent
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Oct 20, 2009
Grant Date -
Aug 5, 2004
app pub date -
Dec 9, 2003
filing date -
Dec 9, 2002
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Abstract
Nano-particles are provided with control circuitry to form a programmable mask. The optical characteristics of the nano-particles change to provide patterned light. Such patterned light can be used for example to expose a photoresist on a semiconductor wafer for photolithography.
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