Systems and methods for correcting optical reflectance measurements
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United States of America Patent
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Nov 10, 2009
Grant Date -
Feb 15, 2007
app pub date -
Apr 25, 2006
filing date -
Apr 25, 2005
priority date (Note) -
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Abstract
We disclose measurement systems and methods for measuring analytes in target regions of samples that also include features overlying the target regions. The systems include: (a) a light source; (b) a detection system; (c) a set of at least first, second, and third light ports which transmit light from the light source to a sample and receive and direct light reflected from the sample to the detection system, generating a first set of data including information corresponding to both an internal target within the sample and features overlying the internal target, and a second set of data including information corresponding to features overlying the internal target; and (d) a processor configured to remove information characteristic of the overlying features from the first set of data using the first and second sets of data to produce corrected information representing the internal target.
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