RET for optical maskless lithography

United States of America Patent

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Nov 17, 2009
Grant Date
Oct 6, 2005
app pub date
Feb 25, 2005
filing date
Feb 25, 2004

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Abstract

The present invention relates to Optical Maskless Lithography (OML). In particular, it relates to providing OML with a recognizable relationship to mask and phase-shift mask techniques.

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MICRONIC LASER SYSTEMS AB

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Inventor Name	Address	# of filed Patents	Total Citations
Martinsson, Hans	Goteburg , SE	16	94
Sandstrom, Torbjorn	Pixbo , SE	95	2628

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RET for optical maskless lithography

Number of patents in Portfolio can not be more than 2000

United States of America Patent

11066828

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PATENT NO	7618751
APP PUB NO	20050219502A1
SERIAL NO	11066828
DOCKET NO

US Family Size	Non-US Coverage
Patent Longevity	Forward Citations

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
November 17, 2009	US,7618751,B2 US7618751B2	GRANTED PATENT AS SECOND PUBLICATION
October 06, 2005	US,20050219502,A1 US20050219502A1	FIRST PUBLISHED PATENT APPLICATION

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11066828

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