Lithographic apparatus and device manufacturing method
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United States of America Patent
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Nov 17, 2009
Grant Date -
May 8, 2008
app pub date -
Nov 8, 2006
filing date -
Nov 8, 2006
priority date (Note) -
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Abstract
The present invention relates to a method for calibrating a grating of an encoder measurement system between two adjacent calibrated locations, the method includes moving one of a sensor object including an encoder-type sensor and a grating along the other one of the sensor object and the grating with a speed, wherein the speed is selected such that disturbances in the grating substantially extending over a distance smaller than a distance between the two calibrated locations can not or only partly be followed by the one of the sensor object and the grating, and measuring during the moving the position of the sensor object with respect to the grating at a plurality of locations between the two calibrated locations.
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