Impurity introducing apparatus and impurity introducing method
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United States of America Patent
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Nov 24, 2009
Grant Date -
Sep 4, 2008
app pub date -
May 16, 2008
filing date -
Mar 30, 2005
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Abstract
It is an object to prevent functions expected originally from being unexhibited when impurities to be introduced into a solid sample are mixed with each other, and to implement plasma doping with high precision. In order to distinguish impurities which may be mixed from impurities which should not be mixed, first of all, an impurity introducing mechanism of a core is first distinguished. In order to avoid a mixture of the impurities in very small amounts, a mechanism for delivering a semiconductor substrate to be treated and a mechanism for removing a resin material to be formed on the semiconductor substrate are used exclusively.
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