Lithographic apparatus and device manufacturing method

United States of America Patent

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Dec 1, 2009
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Jun 28, 2007
app pub date
Dec 9, 2005
filing date
Dec 9, 2005

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Abstract

Apparatus and methods for compensating for the movement of a substrate in a lithographic apparatus during a pulse of radiation include providing a pivotable mirror configured to move a patterned projection beam incident on the substrate in synchronism with the substrate.

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Patent Owner	Address
ASML NETHERLANDS B V	VELDHOVEN

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G21G:CONVERSION OF CHEMICAL ELEMENTS; RADIOACTIVE SOURC....

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Inventor Name	Address	# of filed Patents	Total Citations
Visser, Huibert	Zevenhuizen , NL	31	620

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Lithographic apparatus and device manufacturing method

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United States of America Patent

11297641

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PATENT NO	7626181
APP PUB NO	20070150778A1
SERIAL NO	11297641
DOCKET NO

US Family Size	Non-US Coverage
Patent Longevity	Forward Citations

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
December 01, 2009	US,7626181,B2 US7626181B2	GRANTED PATENT AS SECOND PUBLICATION
June 28, 2007	US,20070150778,A1 US20070150778A1	FIRST PUBLISHED PATENT APPLICATION

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11297641

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