Defective particle measuring apparatus and defective particle measuring method
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United States of America Patent
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Dec 15, 2009
Grant Date -
May 15, 2008
app pub date -
Feb 3, 2006
filing date -
Feb 3, 2005
priority date (Note) -
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status (Latency Note)
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Abstract
A defective particle measuring apparatus that irradiates focused laser light on a sample, images scattered light from the sample, and measures defective particles in the sample based on the image result, includes a position deviation computing portion which, based on an in-plane intensity distribution of scattered light of each defective particle that is imaged, obtains a deviation from a focal point position on an image point side of the scattered light of each defective particle and calculates a position deviation amount in a depth direction of the defective particle corresponding to the deviation from the focal point position, a light intensity correcting portion for correcting the light intensity of the scattered light of the defective particle corresponding to the position deviation amount in the depth direction, and a size determining portion for determining the defective particle size based on the light intensity corrected by the light intensity correcting portion. Thus, the size of the defective particles can be determined at a high precision by a simple constitution in a short time, and density distribution of the defective particles can be obtained.
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