Displacement measurement systems lithographic apparatus and device manufacturing method

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United States of America Patent

PATENT NO 7636165
APP PUB NO 20070223007A1
SERIAL NO

11384834

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Abstract

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A displacement measurement system configured to provide measurement of the relative displacement of two components in six degrees of freedom with improved consistency and without requiring excessive space.

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Patent Owner(s)

Patent OwnerAddress
ASML NETHERLANDS B VVELDHOVEN

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Klaver, Renatus Gerardus Eindhoven , NL 8 192
Loopstra, Erik Roelof Heeze , NL 325 13468
Van, Der Pasch Engelbertus Antonius Fransiscus Oirschot , NL 96 1871

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