Pattern generator using a dual phase step element and method of using same
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United States of America Patent
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Jan 5, 2010
Grant Date -
May 25, 2006
app pub date -
Nov 24, 2004
filing date -
Nov 24, 2004
priority date (Note) -
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Abstract
A system and method are used to pattern light using an illumination system, an array of individually controllable components, and a projection system. The illumination system supplies a beam of radiation. The array of individually controllable elements patterns the beam. The array of individually controllable elements comprises mirrors having first and second steps on opposite edges. The projection system projects the patterned beam onto a target portion of an object. In various examples, the object can be a display, a semiconductor substrate or wafer, a flat panel display glass substrate, or the like, as is discussed in more detail below.
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