Systems and methods for creating crystallographic-orientation controlled poly-silicon films
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United States of America Patent
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Jan 12, 2010
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Nov 18, 2004
filing date -
Nov 18, 2004
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Abstract
In accordance with one aspect, the present invention provides a method for providing polycrystalline films having a controlled microstructure as well as a crystallographic texture. The methods provide elongated grains or single-crystal islands of a specified crystallographic orientation. In particular, a method of processing a film on a substrate includes generating a textured film having crystal grains oriented predominantly in one preferred crystallographic orientation; and then generating a microstructure using sequential lateral solidification crystallization that provides a location-controlled growth of the grains orientated in the preferred crystallographic orientation.
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