Systems for depositing material onto workpieces in reaction chambers and methods for removing byproducts from reaction chambers
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United States of America Patent
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Jan 19, 2010
Grant Date -
Apr 21, 2005
app pub date -
Oct 15, 2003
filing date -
Oct 15, 2003
priority date (Note) -
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Abstract
Systems for depositing material onto workpieces in reaction chambers and methods for removing byproducts from reaction chambers are disclosed herein. In one embodiment, the system includes a gas phase reaction chamber, a first exhaust line coupled to the reaction chamber, first and second traps each in fluid communication with the first exhaust line, and a vacuum pump coupled to the first exhaust line to remove gases from the reaction chamber. The first and second traps are operable independently to individually and/or jointly collect byproducts from the reaction chamber. It is emphasized that this Abstract is provided to comply with the rules requiring an abstract. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.
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