Methods and apparatus for depositing a microcrystalline silicon film for photovoltaic device
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United States of America Patent
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Jan 19, 2010
Grant Date -
Feb 26, 2009
app pub date -
Oct 24, 2008
filing date -
Jun 23, 2006
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Abstract
Methods for depositing a microcrystalline silicon film layer with improved deposition rate and film quality are provided in the present invention. Also, a photovoltaic (PV) cell having a microcrystalline silicon film is provided. In one embodiment, the method produces a microcrystalline silicon film on a substrate at a deposition rate greater than about 20 nm per minute, wherein the microcrystalline silicon film has a crystallized volume between about 20 percent to about 80 percent.
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