Methods and systems for pattern generation based on multiple forms of design data
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United States of America Patent
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Jan 19, 2010
Grant Date -
Jun 7, 2007
app pub date -
Sep 26, 2006
filing date -
Sep 26, 2005
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Abstract
In a pattern generation method, properties of designs are extracted in a mask data preparation system, and the properties are propagated to a lithography write system. A pattern is generated based on fractured design data and the extracted properties. By preserving the design intent to the lithography write system, the fidelity of the pattern replication may improve.
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