Method of adding low-pressure gas continuously to supercritical fluid and apparatus therefor

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United States of America Patent

PATENT NO 7651671
APP PUB NO 20090003124A1
SERIAL NO

11574438

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Abstract

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The present invention is for dissolving a metal complex and a low-pressure additive gas in a supercritical fluid and supplying the same continuously to a reaction vessel, aiming to provide a method and an apparatus for adding a low-pressure gas to a high-pressure supercritical fluid continuously, so that a gas which should be handled with care, such as a combustible gas, can be added to a supercritical fluid without compression. The method for continuously adding a low-pressure gas to a supercritical fluid comprises supplying a reactant gas to a supercritical fluid or a subcritical fluid by repeating, in an alternate manner, a step of storing a reactant gas midway through a piping in a low-pressure state and a step of carrying the reactant gas toward a reaction vessel with the supercritical fluid or the subcritical fluid, so that the reactant gas is continuously charged in the reaction vessel.

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Patent Owner(s)

Patent OwnerAddress
NATIONAL UNIVERSITY CORPORATION UNIVERSITY OF YAMANASHIYAMANASHI 400-8510

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kondoh, Eiichi Kofu, JP 23 274

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