Methods and apparatus for depositing a microcrystalline silicon film for photovoltaic device
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United States of America Patent
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Feb 2, 2010
Grant Date -
Dec 27, 2007
app pub date -
Jun 23, 2006
filing date -
Jun 23, 2006
priority date (Note) -
Expired
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Abstract
Methods for depositing a microcrystalline silicon film layer with improved deposition rate and film quality are provided in the present invention. Also, photovoltaic (PV) cell having a microcrystalline silicon film is provided. In one embodiment, the method produces a microcrystalline silicon film on a substrate at a deposition rate greater than about 20 nm per minute, wherein the microcrystalline silicon film has a crystallized volume between about 20 percent to about 80 percent.
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