Projection exposure apparatus with luminous flux distribution
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United States of America Patent
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Feb 2, 2010
Grant Date -
N/A
app pub date -
Jan 20, 1995
filing date -
Aug 21, 1990
priority date (Note) -
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Abstract
An exposure system is provided for illuminating a fine pattern that may have features extending along orthogonal first and second linear directions. An illumination source may be provided having decreased intensity portions at a center and defined along the first and second directions.
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Cited Art Landscape
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