ALD apparatus and method
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United States of America Patent
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Feb 16, 2010
Grant Date -
Nov 22, 2007
app pub date -
Jun 28, 2004
filing date -
Jun 27, 2003
priority date (Note) -
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Abstract
Improved apparatus and method for SMFD ALD include a method designed to enhance chemical utilization as well as an apparatus that implements lower conductance out of SMFD-ALD process chamber while maintaining full compatibility with standard wafer transport. Improved SMFD source apparatuses (700, 700', 700'') and methods from volatile and non-volatile liquid and solid precursors are disclosed, e.g., a method for substantially controlling the vapor pressure of a chemical source (722) within a source space comprising: sensing the accumulation of the chemical on a sensing surface (711); and controlling the temperature of the chemical source depending on said sensed accumulation.
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