Pattern writing system and pattern writing method
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United States of America Patent
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Feb 16, 2010
Grant Date -
Jul 6, 2006
app pub date -
Apr 9, 2004
filing date -
Apr 11, 2003
priority date (Note) -
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status (Latency Note)
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Abstract
In a pattern writing method for writing a pattern on a substrate by the use of projection patterns output from a mirror device including two-dimensionally arranged micromirrors, exposure is implemented by ON/OFF controlling each micromirror and partly overlapping the projection patterns from the mirror device at least in a one-dimensional direction, thereby accurately controlling the exposure of intermediate amounts of light.
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Cited Art Landscape
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