Method and apparatus for an improved bellows shield in a plasma processing system

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Mar 16, 2010
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Jun 7, 2007
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Feb 5, 2007
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Sep 30, 2002

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Abstract

The present invention presents an improved bellows shield for a plasma processing system, wherein the design and fabrication of the bellows shield coupled to a substrate holder electrode advantageously provides protection of a bellows with substantially minimal erosion of the bellows shield.

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TOKYO ELECTRON LIMITED	3-1 AKASAKA 5-CHOME MINATO-KU TOKYO 1076325 ?1076325

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Inventor Name	Address	# of filed Patents	Total Citations
Mitsuhashi, Kouji	Nirasaki, JP	38	1111
Nakayama, Hiroyuki	Nirasaki, JP	238	3061
Saigusa, Hidehito	Nirasaki, JP	11	420
Takase, Taira	Nirasaki, JP	18	595

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Method and apparatus for an improved bellows shield in a plasma processing system

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United States of America Patent

11671282

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PATENT NO	7678226
APP PUB NO	20070125494A1
SERIAL NO	11671282
DOCKET NO

US Family Size	Non-US Coverage
Patent Longevity	Forward Citations

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
March 16, 2010	US,7678226,B2 US7678226B2	GRANTED PATENT AS SECOND PUBLICATION
June 07, 2007	US,20070125494,A1 US20070125494A1	FIRST PUBLISHED PATENT APPLICATION

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11671282

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