Spin-on-glass anti-reflective coatings for photolithography
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United States of America Patent
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Mar 16, 2010
Grant Date -
Nov 3, 2005
app pub date -
Jul 11, 2005
filing date -
Jun 10, 1999
priority date (Note) -
Expired
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Abstract
Anti-reflective coating materials for deep ultraviolet photolithography include one or more organic light-absorbing compounds incorporated into spin-on-glass materials. Suitable absorbing compounds are strongly absorbing over wavelength ranges around wavelengths such as 365 nm, 248 nm, and 193 nm that may be used in photolithography. A method of making absorbing spin-on-glass materials includes combining one or more organic absorbing compounds with alkoxysilane or halosilane reactants during synthesis of the spin-on-glass materials.
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