Highly efficient gas distribution arrangement for plasma tube of a plasma processing chamber
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United States of America Patent
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Mar 16, 2010
Grant Date -
Jun 28, 2007
app pub date -
Dec 23, 2005
filing date -
Dec 23, 2005
priority date (Note) -
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Abstract
A gas distribution arrangement configured to provide a process gas downstream to a plasma tube of a plasma processing chamber. The plasma tube has a top end. The arrangement includes a body having a first end. The first end has a width larger than the plasma tube and a protrusion end adapted to be inserted into the top end. The arrangement also includes a gas inlet vertically disposed in the body. The gas inlet extends from the first end toward the protrusion end and the gas inlet terminates before extending through the protrusion end. The arrangement further includes a plurality of directional inlet channels extending from a lower end of the gas inlet through the protrusion end.
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