System and method for optical photomask inspection through pellicle
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United States of America Patent
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Mar 16, 2010
Grant Date -
N/A
app pub date -
Jul 26, 2008
filing date -
Jul 27, 2007
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Abstract
A pellicle correction factor is determined by comparing a first measurement of a reference photomask alone with a second measurement of that reference photomask through a reference pellicle protecting the mask layers of the photomask. A number of pellicle correction factors may be determined for different type pellicles and made accessible in pellicle correction factor lookup table of the system or supplied on a separate data storage medium. Raw Reflectance and/or Transmittance measurement data of a generic photomask through a generic pellicle is consecutively corrected for the measurement distorting effects of that pellicle by applying a matching one of the previously determined pellicle correction factors. The pellicle correction factor is preferably an attenuation signature across a predetermined measurement irradiation spectrum.
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