Interferometer endpoint monitoring device
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United States of America Patent
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Mar 23, 2010
Grant Date -
Feb 1, 2007
app pub date -
Sep 13, 2006
filing date -
Sep 26, 2003
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A photomask etch chamber, which includes a substrate support member disposed inside the chamber. The substrate support member is configured to support a photomask substrate. The chamber further includes a ceiling disposed on the chamber and an endpoint detection system configured to detect a peripheral region of the photomask substrate.
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