Modeling and cross correlation of design predicted criticalities for optimization of semiconductor manufacturing
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Apr 6, 2010
Grant Date -
Jun 19, 2008
app pub date -
Dec 18, 2006
filing date -
Dec 18, 2006
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A method and apparatus for modeling and cross correlation of design predicted criticalities include a feedback loop where information from the manufacturing process is provided to cross correlation engine for optimization of semiconductor manufacturing. The information may include parametric information, functional information, and hot spots determination. The sharing of information allows for design intent to be reflected in manufacturing metrology space; thus, allowing for more intelligent metrology and reduces cycle time.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully