Cluster tool architecture for processing a substrate
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United States of America Patent
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Apr 13, 2010
Grant Date -
Dec 14, 2006
app pub date -
Jul 19, 2006
filing date -
Dec 22, 2004
priority date (Note) -
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Abstract
Embodiments generally provide an apparatus and method for processing substrates using a multi-chamber processing system (e.g., a cluster tool) that has an increased system throughput, increased system reliability, substrates processed in the cluster tool have a more repeatable wafer history, and also the cluster tool has a smaller system footprint. Embodiments also provide for a method and apparatus that are used to improve the coater chamber, the developer chamber, the post exposure bake chamber, the chill chamber, and the bake chamber process results. Embodiments also provide for a method and apparatus that are used to increase the reliability of the substrate transfer process to reduce system down time.
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