Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases
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United States of America Patent
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Apr 13, 2010
Grant Date -
Sep 13, 2007
app pub date -
May 7, 2007
filing date -
Dec 31, 1996
priority date (Note) -
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Abstract
An effluent gas stream treatment system for treatment of gaseous effluents such as waste gases from semiconductor manufacturing operations. The effluent gas stream treatment system comprises a pre-oxidation treatment unit, which may for example comprise a scrubber, an oxidation unit such an electrothermal oxidizer, and a post-oxidation treatment unit, such as a wet or dry scrubber. The effluent gas stream treatment system of the invention may utilize an integrated oxidizer, quench and wet scrubber assembly, for abatement of hazardous or otherwise undesired components from the effluent gas stream. Gas or liquid shrouding of gas streams in the treatment system may be provided by high efficiency inlet structures.
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