Reduction of entrance and exit marks left by a substrate-processing meniscus
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United States of America Patent
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Apr 27, 2010
Grant Date -
Apr 3, 2008
app pub date -
Dec 19, 2006
filing date -
Sep 29, 2006
priority date (Note) -
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status (Latency Note)
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Abstract
A proximity head for generating and maintaining a meniscus for processing a substrate is described. The proximity head includes a plurality of meniscus nozzles formed on a face of the proximity head, the nozzles being configured to supply liquid to the meniscus, a plurality of vacuum ports formed on the face of the proximity head, the vacuum ports being arranged to completely surround the plurality of meniscus nozzles, and a plurality of gas nozzles formed on the face of the proximity head, the gas nozzles at least partially surrounding the vacuum ports. The proximity head further includes means for reducing a size and frequency of entrance and/or exit marks at a leading edge and a trailing edge on the substrate by aiding and encouraging liquid from the meniscus to evacuate a gap between the substrate and the carrier.
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