Fractional biasing of semiconductors
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United States of America Patent
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Apr 27, 2010
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N/A
app pub date -
Aug 8, 2005
filing date -
Jan 29, 2004
priority date (Note) -
Expired
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Abstract
A method and system of fractional biasing of semiconductors. A small negative voltage is applied to the back of a semiconductor wafer or device. An operating voltage is applied to the semiconductor. Operating characteristics of the semiconductor are enhanced by application of a fractional bias.
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