Pupil improvement of incoherent imaging systems for enhanced CD linearity
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United States of America Patent
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Apr 27, 2010
Grant Date -
Mar 16, 2006
app pub date -
Aug 23, 2005
filing date -
Aug 23, 2004
priority date (Note) -
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Abstract
A pattern generator may include an electromagnetic radiation source and an optical system. The electromagnetic radiation source may emit electromagnetic radiation to create a pattern on a workpiece. The optical system may include an optical path for the electromagnetic radiation emitted from the electromagnetic radiation source and may be configured such that an apodization of the electromagnetic radiation is sufficient to optimize a critical dimension linearity for the created pattern.
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