Lithographic apparatus and device manufacturing method
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United States of America Patent
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May 4, 2010
Grant Date -
Oct 9, 2008
app pub date -
Apr 5, 2007
filing date -
Apr 5, 2007
priority date (Note) -
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status (Latency Note)
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Abstract
A position control system for a substrate support of a lithographic apparatus includes a position measurement system configured to determine a position of a sensor or sensor target on the substrate support, a controller configured to provide a control signal based on a desired position of a target portion of the substrate and the determined position, and one or more actuators configured to act on the substrate support. The position control system includes a stiffness compensation model of the substrate support, the stiffness compensation model including a relation between a difference in a change in position of the target portion and a change in position of the sensor or sensor target as a result of a force exerted on the substrate support. The position control system is configured to substantially correct at least during projection of a patterned radiation beam on the target portion, the position of the target portion using the stiffness compensation model.
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