Method of fabricating polymer modulators with etch stop clads

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United States of America Patent

PATENT NO 7713428
APP PUB NO 20080290066A1
SERIAL NO

11753052

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Abstract

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A process that comprises dry etching a trench into a side clad polymer layer using an underlying passive polymer layer as an etch stop, and then back filling the trench with an electro-optic polymer.

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Patent Owner(s)

Patent OwnerAddress
GIGPEAK INC130 BAYTECH DRIVE SAN JOSE CA 95134

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Dinu, Raluca Redmond, US 25 165
Jin, Danliang Bothell, US 44 344
Li, Bing Bothell, US 454 3928
Yu, Guomin Bothell, US 84 378

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