Lithographic apparatus and device manufacturing method

United States of America Patent

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May 11, 2010
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Mar 9, 2006
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Dec 9, 2005

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Abstract

Apparatus and methods for compensating for the movement of a substrate in a lithographic apparatus during a pulse of radiation include providing a pivotable mirror configured to move a patterned radiation beam incident on the substrate in substantial synchronism with the substrate.

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Patent Owner	Address
ASML NETHERLANDS B V	P O BOX 324 VELDHOVEN 5500 AH
ASML HOLDING NV	DE RUN 6501 VELDHOVEN NL-5504 DR

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G21G:CONVERSION OF CHEMICAL ELEMENTS; RADIOACTIVE SOURC....

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Inventor Name	Address	# of filed Patents	Total Citations
Callan, David William	Norwalk, US	3	25
Munnig, Schmidt Robert-Han	Hapert, NL	21	104
Robbins, George Howard	New Canaan, US	2	11
Visser, Huibert	Zevenhuizen, NL	31	620

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Lithographic apparatus and device manufacturing method

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United States of America Patent

11371232

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US Family Size	Non-US Coverage
Patent Longevity	Forward Citations

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
May 11, 2010	US,7714305,B2 US7714305B2	GRANTED PATENT AS SECOND PUBLICATION
June 28, 2007	US,20070150779,A1 US20070150779A1	FIRST PUBLISHED PATENT APPLICATION

PATENT NO	7714305
SERIAL NO	11371232
DOCKET NO

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11371232

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