Method of designing a projection system, lithographic apparatus and device manufacturing method

United States of America Patent

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May 11, 2010
Grant Date
Jul 19, 2007
app pub date
Sep 8, 2006
filing date
Sep 9, 2005

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Abstract

, that are new minima in the merit function. Each resulting configuration is output, e.g., as a table of parameters specifying the projection system or as a computer file for use in making an actual projection system.

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Patent Owner(s)

ASML NETHERLANDS B.V.;CARL ZEISS SMT AG;TECHNISCHE UNIVERSITEIT DELFT

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H01J:ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS

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Inventor Name	Address	# of filed Patents	Total Citations
Bociort, Florian	Delft, NL	2	53
Marinescu, Oana Elena	Delft, NL	1	0
van, Turnhout Maarten	Rotterdam, NL	1	0

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Method of designing a projection system, lithographic apparatus and device manufacturing method

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United States of America Patent

11517578

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PATENT NO	7714307
APP PUB NO	20070165296A1
SERIAL NO	11517578
DOCKET NO

US Family Size	Non-US Coverage
Patent Longevity	Forward Citations

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
May 11, 2010	US,7714307,B2 US7714307B2	GRANTED PATENT AS SECOND PUBLICATION
July 19, 2007	US,20070165296,A1 US20070165296A1	FIRST PUBLISHED PATENT APPLICATION

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11517578

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