Apparatus for double-sided imprint lithography
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United States of America Patent
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May 18, 2010
Issued Date -
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app pub date -
Aug 13, 2004
filing date -
Jul 18, 2000
priority date (Note) -
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Abstract
Apparatus for double-sided imprint lithography of an apertured substrate comprises a pair of correspondingly apertured molds, a support for an assembly of the substrate and molds, and an alignment mechanism with radially movable elements for aligning the apertures of the molds and the substrate. The movable elements can be at least partially disposed in a spindle and can be removed radially outward by a conically tapered drive rod. Opposing surfaces of the substrate can then be imprinted in registration at the same time, preferably by fluid pressure imprint lithography.
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