Method for photomask fabrication utilizing a carbon hard mask
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United States of America Patent
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May 18, 2010
Grant Date -
Jun 5, 2008
app pub date -
Nov 30, 2006
filing date -
Sep 28, 2005
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Abstract
Methods for forming a photomask using a carbon hard mask are provided. In one embodiment, a method of forming a photomask includes etching a chromium layer through a patterned carbon hard mask layer in the presence of a plasma formed from a process gas containing chlorine and carbon monoxide.
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