Condition assessment method for a structure including a semiconductor material
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United States of America Patent
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Jun 1, 2010
Issued Date -
N/A
app pub date -
Dec 14, 2007
filing date -
Jul 26, 1999
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Abstract
An improved condition testing system and method includes a structure including a semiconductor material with a target portion and a second portion. The target portion has a first feature when at least one of the following occurs: an external force is received by the second portion of the structure and an internal condition occurs in the target portion. The system and method further has a grating shaped and located to produce a first optical interference pattern when the target portion and the grating are exposed to non-invasive illumination and when the target portion has the first feature. Further implementations use a second grating spaced apart from the first grating.
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