Plasma processing apparatus and plasma processing method

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Jun 15, 2010
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Oct 15, 2009
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Oct 10, 2006
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Oct 12, 2005

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Abstract

is improved and processing is uniformed at the entire region of the substrate surface including the vicinity of the outer peripheral edge.

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PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.

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Inventor Name	Address	# of filed Patents	Total Citations
Asakura, Hiromi	Hyogo, JP	11	1839
Houchin, Ryuzou	Osaka, JP	6	1052
Okita, Shogo	Hyogo, JP	83	2361
Suzuki, Hiroyuki	Osaka, JP	830	9965
Watanabe, Syouzou	Osaka, JP	13	1153

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Plasma processing apparatus and plasma processing method

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United States of America Patent

12090214

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PATENT NO	7736528
APP PUB NO	20090255901A1
SERIAL NO	12090214
DOCKET NO

US Family Size	Non-US Coverage
Patent Longevity	Forward Citations

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
June 15, 2010	US,7736528,B2 US7736528B2	GRANTED PATENT AS SECOND PUBLICATION
October 15, 2009	US,20090255901,A1 US20090255901A1	FIRST PUBLISHED PATENT APPLICATION

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12090214

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