Method for the protection of extreme ultraviolet lithography optics

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United States of America Patent

PATENT NO 7740916
APP PUB NO 20100124723A1
SERIAL NO

10818586

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Abstract

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S is particularly advantageous since films of the plasma-induced decomposition products S and P cannot grow to greater than 10 Å thick in a vacuum atmosphere such as found in an EUVL machine.

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Patent OwnerAddress
NATIONAL TECHNOLOGY & ENGINEERING SOLUTIONS OF SANDIA LLCP O BOX 5800 MS-0161 LEGAL TECHNOLOGY TRANSFER CENTER ALBUQUERQUE NM 87185

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Clift, Wayne M Tracy, US 1 0
Grunow, Philip A San Leandro, US 1 0
Klebanoff, Leonard E San Clemente, US 24 305

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