Plasma treatment between deposition processes
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United States of America Patent
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Jun 22, 2010
Grant Date -
Jun 4, 2009
app pub date -
Oct 31, 2008
filing date -
Nov 2, 2007
priority date (Note) -
Expired
status (Latency Note)
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Abstract
Embodiments of the present invention include an improved method of forming a thin film solar cell device using a plasma processing treatment between two or more deposition steps. Embodiments of the invention also generally provide a method and apparatus for forming the same. The present invention may be used to advantage to form other single junction, tandem junction, or multi-junction solar cell devices.
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