Wiring structure of laminated capacitors

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United States of America Patent

PATENT NO 7742276
SERIAL NO

11950381

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Abstract

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The present invention relates to a wiring structure for reducing the equivalent series inductance (ESL) of a laminated capacitor. The laminated capacitor comprises a number of conductive layers, a power via extending along a thickness direction of the laminated capacitor and arranged to extend from the top conductive layer to the bottom conductive layer, and a ground via extending along the thickness direction of the laminated capacitor and arranged to extend from the top conductive layer to the bottom conductive layer. The conductive layers include a set of first conductive layers and a set of second conductive layers. The power via is electrically coupled to the first conductive layers and the ground via is electrically coupled to the second conductive layers. The laminated capacitor further comprises a supplemental via between the power via and the ground via. The supplemental via is shorter in length than the power via and the ground via. The supplemental via is electrically coupled to one of the first conductive layers and the second conductive layer.

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Patent Owner(s)

Patent OwnerAddress
INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEHSINCHU

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hsu, Chien-Min Wugu Shiang, TW 16 168
Lai, Shinn-Juh Zhudong Town, TW 18 321
Lee, Min-Lin Hsinchu, TW 50 604
Wu, Shih-Hsien Yangmei Town, TW 34 395

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