Method and apparatus for plasma gasification of waste materials
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United States of America Patent
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Jul 13, 2010
Grant Date -
Dec 20, 2007
app pub date -
Jun 16, 2006
filing date -
Jun 16, 2006
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Abstract
A method and apparatus for plasma gasification of waste materials consisting of organic and inorganic portions is provided which includes a refractory-lined reactor vessel, a feeder mechanism, and a DC electrode device. The refractory-lined reactor vessel has a processing chamber formed therein. The feeder mechanism feeds continuously waste materials into the processing chamber at a controlled feed rate. The DC electrode device is used for heating the processing chamber to a sufficient temperature so as to convert the organic portions of the waste materials to a synthetic gas consisting of hydrogen and carbon monoxide and to a carbon particulate, and to convert the inorganic portions of the waste materials to a molten material consisting of a lower metallic layer and a slag layer formed on top of the metallic layer.
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