Apparatus and method for nanoscale pattern generation

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United States of America Patent

PATENT NO 7752997
SERIAL NO

11354341

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Abstract

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A method and apparatus that produces highly ordered, nanosized particle arrays on various substrates. These regular arrays may be used as masks to deposit and grow other nanoscale materials.

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Patent Owner(s)

Patent OwnerAddress
NANOLAB INCNEWTON MA

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Carnahan, David L Needham, US 20 94

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