Methods for reducing surface charges during the manufacture of microelectromechanical systems devices
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United States of America Patent
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Jul 27, 2010
Grant Date -
Feb 7, 2008
app pub date -
Aug 2, 2006
filing date -
Aug 2, 2006
priority date (Note) -
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Abstract
Provided herein are methods for preventing the formation and accumulation of surface-associated charges, and deleterious effects associated therewith, during the manufacture of a MEMS device. In some embodiments, methods provided herein comprise etching a sacrificial material in the presence of an ionized gas, wherein the ionized gas neutralizes charged species produced during the etching process and allows for their removal along with other etching byproducts. Also disclosed are microelectromechanical devices formed by methods of the invention, and visual display devices incorporating such devices.
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